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HIOKI IR4053 ENG 98%
Accurate and safe measurement without creating shorts Normally, to accurately measure the insulation resistance of a generating PV, one needs to short the measured circuit.
HIOKI BT4560 ENG 98%
2 Incomparable Speed Exceptional Accuracy Unsurpassed Stability Fast Low-frequency AC-IR measurement enables faster measurement No need to charge/discharge Traditionally, the internal resistance of battery cells is measured by pre-charging the battery, then passing large currents and measuring the voltage drop (DC-IR measurement).
HIOKI DSM 8104 ENG DIGITAL SUPER MEGOHMMETER DSM-8104, DSM-8542 Super Megohm Testers DSM-8104 (Single-Channel) DSM-8542 (Four-Channel) Options Supporting Measurements such as Surface and Volume Resistivity Power Supply Unit PSU-8541 Fast, Highly Accurate Measurement 3 × 10 16 Ω and 0.1 fA Current Resolution 2 A High Insulator with the Capacitance (the Ingredient of a Condenser) can also be Measured.
HIOKI TM6101 ENG 97%
Additionally, updated software functionality provides the ability to generate PASS/FAIL judgments and rank measured values, making the TM6101 ideal for embedding on lines used to test LED lighting.
HIOKI FT3424 ENG 96%
HIOKI FT3424 ENG LUX METER FT3424 Environmental measuring instruments Broad coverage from low to high illuminance Measure at 0.01 lx resolution to a maximum of 200,000 lx Compatible with LED lighting • Complies with DIN Class B and JIS Class AA • Save up to 99 measured values in the instrument’s internal memory and transfer them to a computer later for improved work efficiency • Timer hold function lets you make measurements in remote locations while avoiding the effects of shadows and reflections 2 Support for measurement of 1 lx makes the FT3424 ideal for low-illuminance measurement 20 lx range measurement resolution 0.01 lx 1.
Both thickness and optical constants of the alumina can be measured accurately using MProbe system.
Measurement of the thin films on the bottom of a deep well i.e. the well with high aspect ratio, presents a challenge. Small spot measurement requires high‐NA objective. However, high‐NA objective also limits the depth of the well that can be measured. In this example, our MProbe ™ Vis MSP* system was used to measure oxide (SiO2) layer on the bottom of the round wells. The wells diameters were 80µm, 40µm, 20µm and 10µm ‐ all 100µm deep. The top surface of the sample (Si) had photoresist layer left after lithography. Round wells geometry were selected because it is most difficult to measure as compared to square wells or vias of the same geometry. 20x APO objectives with long working distance (35mm) was use for this measurement. The measurement spot size was ~ 20um. The reason for using this objective was because it has the lowest NA (0.29), which is critical for measurement in the deep wells. Measurements in 80μm and 40μm wells gave a clean signal and were easy to align and focus. In measurements of 20μm and 10μm wells, a part of the light beam was reflected from the top PR, so both oxide thickness and PR thickness signal were present in the measurement, as expected. However, it was still easy to distinguish and determine oxide thickness because of the significantly the thicknesses of oxide and PR were significantly different. The thickness of oxide was ~ 1.6 µm, the thickness of PR ~ 3 µm * MProbe is a registered trademark of Semiconsoft,Inc, Inc. MProbe™ Vis MSP brochure can be found at: http://www.semiconsoft.com/html/download/brochure/MProbeMicro_brochure2012.pdf 83 Pine Hill Rd.
The thickness of the emulsion needs to be measured for quality control, before the silver paste printing step.